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electronic surface states of Si(111)-7x7

Posted: Mon Jul 10, 2006 5:39 am
by leegeunsik
Dear all,

Have anyone got correct eigenvalues for S2(rest atom induced) surface states?
In the literatures, S2 should be 0.7~0.9 eV below Fermi level.
But my result is 0.5~0.7 eV.
Si(111)-7x7 DAS structure was modeled by 6-layer slab.
Total number of atoms in unit cell is 347 including bottom 49 hydrogens.
I can not understand why VASP gives 0.2 eV higher S2 states.
Could you give any comments?

Regards,
Geunsik

<span class='smallblacktext'>[ Edited ]</span>

electronic surface states of Si(111)-7x7

Posted: Tue Jul 11, 2006 8:53 am
by admin
have you converged all input parameters as well as the ionic and electronic structure carefully?
by 'literature', do you mean experiments or calculations using different methods

electronic surface states of Si(111)-7x7

Posted: Mon Jul 17, 2006 5:58 am
by leegeunsik
I have used default values for EDIFFG, ENCUT.
Also the convergence w.r.t. slab-thickness and energy-cut were checked. Both LDA and GGA potentials were tried.
As to 'literatures', the experimental value is -0.9 eV.
Also PW-calculation by Brommer (Jpan. J. Appl. Phys. 32 pp.1360) gives S2 of -0.7~-0.9 eV.